Freestanding nanostructures via reactive ion beam angled etching
نویسندگان
چکیده
منابع مشابه
Colloidal lithographic nanopatterning via reactive ion etching.
We report here a novel colloidal lithographic approach to the fabrication of nonspherical colloidal particle arrays with a long-range order by selective reactive ion etching (RIE) of multilayered spherical colloidal particles. First, layered colloidal crystals with different crystal structures (or orientations) were self-organized onto substrates. Then, during the RIE, the upper layer in the co...
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Large area Multilayer Dielectric (MLD) diffraction gratings are essential components for temporal pulse compression in high energy laser systems. MLD grating designs typically consist of a silica grating layer on top of a dielectric multilayer reflector. A reactive ion beam etching (RIBE) process using a gridded radio frequency (RF) ion source was developed to uniformly etch the silica grating ...
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For many emerging optoelectronic materials, heteroepitaxial growth techniques do not offer the same high material quality afforded by bulk, single-crystal growth. However, the need for optical, electrical, or mechanical isolation at the nanoscale level often necessitates the use of a dissimilar substrate, upon which the active device layer stands. Faraday cage angled-etching (FCAE) obviates the...
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ژورنال
عنوان ژورنال: APL Photonics
سال: 2017
ISSN: 2378-0967
DOI: 10.1063/1.4982603